Silicon metal serves as the primary substrate material for semiconductor device fabrication. Silicon wafers provide a stable and highly controlled platform for building various electronic component...
DESCRIPTION
Silicon metal serves as the primary substrate material for semiconductor device fabrication. Silicon wafers provide a stable and highly controlled platform for building various electronic components, such as transistors, diodes, and integrated circuits.
Silicon metal is highly compatible with the manufacturing processes used in the semiconductor industry.
Garde | Composition | ||||
Si Content(%) | Impurities(%) | ||||
Fe | Al | Ca | P | ||
1501 | 99.69 | 0.15 | 0.15 | 0.01 | ≤0.004% |
1502 | 99.68 | 0.15 | 0.15 | 0.02 | ≤0.004% |
1101 | 99.79 | 0.1 | 0.1 | 0.01 | ≤0.004% |
2202 | 99.58 | 0.2 | 0.2 | 0.02 | ≤0.004% |
2502 | 99.48 | 0.25 | 0.25 | 0.02 | ≤0.004% |
3303 | 99.37 | 0.3 | 0.3 | 0.03 | ≤0.005% |
411 | 99.4 | 0.4 | 0.1 | 0.1 | ≤0.005% |
421 | 99.3 | 0.4 | 0.2 | 0.1 | – |
441 | 99.1 | 0.4 | 0.4 | 0.1 | – |
551 | 98.9 | 0.5 | 0.5 | 0.1 | – |
553 | 98.7 | 0.5 | 0.5 | 0.3 | – |
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