Ferro alloy
Advancing Semiconductor Technologies with Silicon Metal
Silicon metal serves as the primary substrate material for the fabrication of semiconductor devices. Its crystalline structure and electrical properties make it an ideal material for building integ...
DESCRIPTION
Silicon metal serves as the primary substrate material for the fabrication of semiconductor devices. Its crystalline structure and electrical properties make it an ideal material for building integrated circuits, transistors, and other electronic components.
Silicon metal has enabled the mass production and scalability of semiconductor devices. The silicon manufacturing processes, such as crystal growth, wafer production, and lithography, have been optimized to produce large quantities of high-quality silicon wafers for semiconductor fabrication.
| Garde | Composition | ||||
| Si Content(%) | Impurities(%) | ||||
| Fe | Al | Ca | P | ||
| 1501 | 99.69 | 0.15 | 0.15 | 0.01 | ≤0.004% |
| 1502 | 99.68 | 0.15 | 0.15 | 0.02 | ≤0.004% |
| 1101 | 99.79 | 0.1 | 0.1 | 0.01 | ≤0.004% |
| 2202 | 99.58 | 0.2 | 0.2 | 0.02 | ≤0.004% |
| 2502 | 99.48 | 0.25 | 0.25 | 0.02 | ≤0.004% |
| 3303 | 99.37 | 0.3 | 0.3 | 0.03 | ≤0.005% |
| 411 | 99.4 | 0.4 | 0.1 | 0.1 | ≤0.005% |
| 421 | 99.3 | 0.4 | 0.2 | 0.1 | – |
| 441 | 99.1 | 0.4 | 0.4 | 0.1 | – |
| 551 | 98.9 | 0.5 | 0.5 | 0.1 | – |
| 553 | 98.7 | 0.5 | 0.5 | 0.3 | – |
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